题名 | Bilayer tellurene-metal interfaces |
作者 | |
通讯作者 | Wang,Yangyang |
发表日期 | 2019
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DOI | |
发表期刊 | |
ISSN | 1674-4926
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卷号 | 40期号:6 |
摘要 | Tellurene, an emerging two-dimensional chain-like semiconductor, stands out for its high switch ratio, carrier mobility and excellent stability in air. Directly contacting the 2D semiconductor materials with metal electrodes is a feasible doping means to inject carriers. However, Schottky barrier often arises at the metal-semiconductors interface, impeding the transport of carriers. Herein, we investigate the interfacial properties of BL tellurene by contacting with various metals including graphene by using ab initio calculations and quantum transport simulations. Vertical Schottky barriers take place in Ag, Al, Au and Cu electrodes according to the maintenance of the noncontact tellurene layer band structure. Besides, a p-Type vertical Schottky contact is formed due to the van der Waals interaction for graphene electrode. As for the lateral direction, p-Type Schottky contacts take shape for bulk metal electrodes (hole Schottky barrier heights (SBHs) ranging from 0.19 to 0.35 eV). Strong Fermi level pinning takes place with a pinning factor of 0.02. Notably, a desirable p-Type quasi-Ohmic contact is developed for graphene electrode with a hole SBH of 0.08 eV. Our work sheds light on the interfacial properties of BL tellurene based transistors and could guide the experimental selections on electrodes. |
关键词 | |
相关链接 | [Scopus记录] ; [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 其他
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资助项目 | National Natural Science Foundation of China[11674005][11664026,11704406]
; National Materials Genome Project of China[2016YFB0700600]
; Key Research and Development Program of Ningxia[2018BEE03023]
; Natural Science Foundation of Ningxia[2018AAC03236]
; Higher School Scientific Research Project of Ningxia Department of Education[NGY2018-130]
; Key Scientific Research Project of Ningxia Normal University[NXSFZDA1807]
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WOS研究方向 | Physics
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WOS类目 | Physics, Condensed Matter
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WOS记录号 | WOS:000475376300009
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出版者 | |
Scopus记录号 | 2-s2.0-85069701722
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来源库 | Scopus
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引用统计 |
被引频次[WOS]:9
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/44092 |
专题 | 理学院_物理系 量子科学与工程研究院 |
作者单位 | 1.State Key Laboratory for Mesoscopic Physics and Department of PhysicsPeking University,Beijing,100871,China 2.Collaborative Innovation Center of Quantum Matter,Beijing,100871,China 3.Shenzhen Institute for Quantum Science and Technology and Department of PhysicsSouthern University of Science and Technology,Shenzhen,518055,China 4.School of Physics and Electronic Information EngineeringEngineering Research Center of Nanostructure and Functional MaterialsNingxia Normal University,Guyuan,756000,China 5.Nanophotonics and Optoelectronics Research CenterQian Xuesen Laboratory of Space TechnologyChina Academy of Space Technology,Beijing,100094,China 6.Beijing Key Laboratory for Magnetoeletric Materials and Devices (BKL-MEMD),Beijing,100871,China |
推荐引用方式 GB/T 7714 |
Pang,Hua,Yan,Jiahuan,Yang,Jie,et al. Bilayer tellurene-metal interfaces[J]. Journal of Semiconductors,2019,40(6).
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APA |
Pang,Hua.,Yan,Jiahuan.,Yang,Jie.,Liu,Shiqi.,Pan,Yuanyuan.,...&Lv,Jing.(2019).Bilayer tellurene-metal interfaces.Journal of Semiconductors,40(6).
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MLA |
Pang,Hua,et al."Bilayer tellurene-metal interfaces".Journal of Semiconductors 40.6(2019).
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
10.1088@1674-4926@40(192KB) | -- | -- | 开放获取 | -- | 浏览 |
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