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题名

Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps

作者
通讯作者Duan, Huigao
发表日期
2019-11-06
DOI
发表期刊
ISSN
2195-1071
卷号8期号:2
摘要
Aluminum is one of the most significant plasmonic materials for its advantage of low cost, natural abundance, as well as the ultraviolet optical response. However, it is still very challengeable for the fabrication of aluminum plasmonic nanogaps, which greatly limits the applications of aluminum plasmonics considering the essential role of nanogaps for electric field enhancement. Here, the reliable patterning of aluminum plasmonic nanogaps employing a modified "Sketch and Peel" lithography strategy is demonstrated. By introducing a self-assembled monolayer to engineer the surface energy of the substrate, the adhesiveness of the aluminum film outside outline template is significantly decreased to implement the selective peeling process. Besides, the near-infrared Fano resonance in the periodic aluminum heptamers has been first revealed by enabling the strong electric field and plasmon coupling in the aluminum nanostructures with 10 nm scale nanogaps. In addition, surface-enhanced Raman spectroscopy and infrared spectroscopy are also illustrated in the rationally designed aluminum dimers. The present work provides a robust method to obtain aluminum plasmonic nanogaps, which may play an important role on the practical applications of aluminum plasmonics, such as surface-enhanced vibration spectroscopy and nonlinear optics.
关键词
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
其他
资助项目
National Natural Science Foundation of China[51722503] ; National Natural Science Foundation of China[51621004] ; National Natural Science Foundation of China[51805160] ; National Natural Science Foundation of China[11574078]
WOS研究方向
Materials Science ; Optics
WOS类目
Materials Science, Multidisciplinary ; Optics
WOS记录号
WOS:000494618000001
出版者
EI入藏号
20194607686435
EI主题词
Adhesion ; Adhesives ; Electric fields ; Infrared devices ; Infrared spectroscopy ; Lithography ; Nanostructures ; Nonlinear optics ; Plasmonics ; Raman spectroscopy ; Self assembled monolayers
EI分类号
Aluminum:541.1 ; Electricity: Basic Concepts and Phenomena:701.1 ; Nonlinear Optics:741.1.1 ; Nanotechnology:761 ; Solid State Physics:933 ; Materials Science:951
来源库
Web of Science
引用统计
被引频次[WOS]:7
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/44763
专题工学院_电子与电气工程系
作者单位
1.Hunan Univ, Coll Mech & Vehicle Engn, State Key Lab Adv Design & Mfg Vehicle Body, Changsha 410082, Hunan, Peoples R China
2.Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China
推荐引用方式
GB/T 7714
Chen, Yiqin,Zhang, Shi,Shu, Zhiwen,et al. Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps[J]. Advanced Optical Materials,2019,8(2).
APA
Chen, Yiqin.,Zhang, Shi.,Shu, Zhiwen.,Wang, Zhaolong.,Liu, Peng.,...&Liu, Yanjun.(2019).Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps.Advanced Optical Materials,8(2).
MLA
Chen, Yiqin,et al."Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps".Advanced Optical Materials 8.2(2019).
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