题名 | Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps |
作者 | |
通讯作者 | Duan, Huigao |
发表日期 | 2019-11-06
|
DOI | |
发表期刊 | |
ISSN | 2195-1071
|
卷号 | 8期号:2 |
摘要 | Aluminum is one of the most significant plasmonic materials for its advantage of low cost, natural abundance, as well as the ultraviolet optical response. However, it is still very challengeable for the fabrication of aluminum plasmonic nanogaps, which greatly limits the applications of aluminum plasmonics considering the essential role of nanogaps for electric field enhancement. Here, the reliable patterning of aluminum plasmonic nanogaps employing a modified "Sketch and Peel" lithography strategy is demonstrated. By introducing a self-assembled monolayer to engineer the surface energy of the substrate, the adhesiveness of the aluminum film outside outline template is significantly decreased to implement the selective peeling process. Besides, the near-infrared Fano resonance in the periodic aluminum heptamers has been first revealed by enabling the strong electric field and plasmon coupling in the aluminum nanostructures with 10 nm scale nanogaps. In addition, surface-enhanced Raman spectroscopy and infrared spectroscopy are also illustrated in the rationally designed aluminum dimers. The present work provides a robust method to obtain aluminum plasmonic nanogaps, which may play an important role on the practical applications of aluminum plasmonics, such as surface-enhanced vibration spectroscopy and nonlinear optics. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 其他
|
资助项目 | National Natural Science Foundation of China[51722503]
; National Natural Science Foundation of China[51621004]
; National Natural Science Foundation of China[51805160]
; National Natural Science Foundation of China[11574078]
|
WOS研究方向 | Materials Science
; Optics
|
WOS类目 | Materials Science, Multidisciplinary
; Optics
|
WOS记录号 | WOS:000494618000001
|
出版者 | |
EI入藏号 | 20194607686435
|
EI主题词 | Adhesion
; Adhesives
; Electric fields
; Infrared devices
; Infrared spectroscopy
; Lithography
; Nanostructures
; Nonlinear optics
; Plasmonics
; Raman spectroscopy
; Self assembled monolayers
|
EI分类号 | Aluminum:541.1
; Electricity: Basic Concepts and Phenomena:701.1
; Nonlinear Optics:741.1.1
; Nanotechnology:761
; Solid State Physics:933
; Materials Science:951
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:7
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/44763 |
专题 | 工学院_电子与电气工程系 |
作者单位 | 1.Hunan Univ, Coll Mech & Vehicle Engn, State Key Lab Adv Design & Mfg Vehicle Body, Changsha 410082, Hunan, Peoples R China 2.Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518055, Peoples R China |
推荐引用方式 GB/T 7714 |
Chen, Yiqin,Zhang, Shi,Shu, Zhiwen,et al. Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps[J]. Advanced Optical Materials,2019,8(2).
|
APA |
Chen, Yiqin.,Zhang, Shi.,Shu, Zhiwen.,Wang, Zhaolong.,Liu, Peng.,...&Liu, Yanjun.(2019).Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps.Advanced Optical Materials,8(2).
|
MLA |
Chen, Yiqin,et al."Adhesion-Engineering-Enabled "Sketch and Peel" Lithography for Aluminum Plasmonic Nanogaps".Advanced Optical Materials 8.2(2019).
|
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
adom.201901202.pdf(1793KB) | -- | -- | 限制开放 | -- |
|
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论