Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering

Li, Zhi-Yue1,2,3,4; Chen, Sheng-Chi3,4,5; Huo, Qiu-Hong1; Liao, Ming-Han6; Dai, Ming-Jiang7; Lin, Song-Sheng7; Yang, Tian-Lin1; Sun, Hui1

2019-11

10.3390/coatings9110715

Coatings   影响因子和分区

2079-6412

2079-6412

In-Sn-Zn oxide (ITZO) thin films have been studied as a potential material in flat panel displays due to their high carrier concentration and high mobility. In the current work, ITZO thin films were deposited on glass substrates by high-power impulse magnetron sputtering (HiPIMS) at room temperature. The influence of the sputtering power on the microstructures and electrical performance of ITZO thin films was investigated. The results show that ITZO thin films prepared by HiPIMS were dense and smooth. There were slight variations in the composition of ITZO thin films deposited at different sputtering powers. With the sputtering power increasing from 100 W to 400 W, the film's crystallinity was enhanced. When the sputtering power was 400 W, an In2O3 (104) plane could be detected. Films with optimal electrical properties were produced at a sputtering power of 300 W, a carrier mobility of 31.25 cm(2).V-1.s(-1), a carrier concentration of 9.11 x 10(18) cm(-3), and a resistivity of 2.19 x 10(-4) Omega.m.

ITZO film high power impulse magnetron sputtering sputtering power electrical properties

SCI

英语

其他

Ministry of Science and Technology of Taiwan[107-2221-E-131-036]

Materials Science

Materials Science, Coatings & Films

WOS:000502298300025

MDPI

Web of Science

1.Shandong Univ Weihai, Sch Space Sci & Phys, Shandong Prov Key Lab Opt Astron & Solar Terr Env, Weihai 264209, Peoples R China
2.Southern Univ Sci & Technol, Shenzhen Key Lab Quantum Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China
3.Ming Chi Univ Technol, Dept Mat Engn, Taipei 243, Taiwan
4.Ming Chi Univ Technol, Ctr Plasma & Thin Film Technol, Taipei 243, Taiwan
5.Chang Gung Univ, Coll Engn, Taoyuan 333, Taiwan
6.Natl Taiwan Univ, Dept Mech Engn, Taipei 106, Taiwan
7.Guangdong Inst New Mat, Key Lab Guangdong Modern Surface Engn Technol, Natl Engn Lab Modern Mat Surface Engn Technol, Guangzhou 510651, Guangdong, Peoples R China

Li, Zhi-Yue,Chen, Sheng-Chi,Huo, Qiu-Hong,et al. Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering[J]. Coatings,2019,9(11).

Li, Zhi-Yue.,Chen, Sheng-Chi.,Huo, Qiu-Hong.,Liao, Ming-Han.,Dai, Ming-Jiang.,...&Sun, Hui.(2019).Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering.Coatings,9(11).

Li, Zhi-Yue,et al."Influence of Sputtering Power on the Electrical Properties of In-Sn-Zn Oxide Thin Films Deposited by High Power Impulse Magnetron Sputtering".Coatings 9.11(2019).