题名 | Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers |
作者 | |
通讯作者 | Cheng, Chun |
发表日期 | 2019-12
|
DOI | |
发表期刊 | |
ISSN | 1528-7483
|
EISSN | 1528-7505
|
卷号 | 19期号:12页码:7007-7014 |
摘要 | Atomically smooth hexagonal boron nitride (h-BN) films are needed for emerging applications of two-dimensional (2D) devices based on vander Waals heterostructures. Currently, it is difficult to prepare high-quality, large-area single crystalline h-BN monolayers by standard chemical vapor deposition. Here, we develop a free-molecular-flow growth model for h-BN synthesis by constructing a narrow gap within Cu/supporting substrates stacking, improving upon earlier studies by increasing domain sizes up to similar to 80 mu m. Further, the edges of h-BN varying from negative-curved to straight, positive-curved, and even round were reliably modified by varying the precursor heating temperature. Moreover, the merging processes of h-BN films are experimentally investigated, demonstrating the Bravais law is applicable for the coalescence of h-BN domains. This work not only offers a promising strategy for high-quality h-BN growth and insight into its growth dynamics which sheds light on reliable edge controllability and possible properties modification of other 2D crystals, but also enriches the understanding of the classical crystal growth theory and extends its applicability into the growth and evolution of 2D crystals. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 第一
; 通讯
|
资助项目 | Shenzhen Science and Technology Innovation Committee Maker Project[GRCK2017082316224369]
|
WOS研究方向 | Chemistry
; Crystallography
; Materials Science
|
WOS类目 | Chemistry, Multidisciplinary
; Crystallography
; Materials Science, Multidisciplinary
|
WOS记录号 | WOS:000501621100021
|
出版者 | |
EI入藏号 | 20194707703864
|
EI主题词 | Chemical vapor deposition
; Crystals
; III-V semiconductors
; Monolayers
; Nitrides
; Van der Waals forces
|
EI分类号 | Physical Chemistry:801.4
; Chemical Reactions:802.2
; Inorganic Compounds:804.2
; Crystalline Solids:933.1
|
ESI学科分类 | CHEMISTRY
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:11
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/50791 |
专题 | 工学院_材料科学与工程系 |
作者单位 | 1.Southern Univ Sci & Technol, Dept Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China 2.Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Clear Water Bay, Hong Kong, Peoples R China 3.Hong Kong Univ Sci & Technol, Ctr 1D 2D Quantum Mat, Kowloon, Clear Water Bay, Hong Kong, Peoples R China 4.Western Sydney Univ, Ctr Infrastruct Engn, Kingswood, NSW 2751, Australia |
第一作者单位 | 材料科学与工程系 |
通讯作者单位 | 材料科学与工程系 |
第一作者的第一单位 | 材料科学与工程系 |
推荐引用方式 GB/T 7714 |
Wang, Weijun,Shi, Run,Wang, Jingwei,et al. Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers[J]. CRYSTAL GROWTH & DESIGN,2019,19(12):7007-7014.
|
APA |
Wang, Weijun.,Shi, Run.,Wang, Jingwei.,Shen, Nan.,Wang, Yu.,...&Cheng, Chun.(2019).Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers.CRYSTAL GROWTH & DESIGN,19(12),7007-7014.
|
MLA |
Wang, Weijun,et al."Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers".CRYSTAL GROWTH & DESIGN 19.12(2019):7007-7014.
|
条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
Wang-2019-Free-Molec(3707KB) | -- | -- | 限制开放 | -- |
|
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论