中文版 | English
题名

Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers

作者
通讯作者Cheng, Chun
发表日期
2019-12
DOI
发表期刊
ISSN
1528-7483
EISSN
1528-7505
卷号19期号:12页码:7007-7014
摘要
Atomically smooth hexagonal boron nitride (h-BN) films are needed for emerging applications of two-dimensional (2D) devices based on vander Waals heterostructures. Currently, it is difficult to prepare high-quality, large-area single crystalline h-BN monolayers by standard chemical vapor deposition. Here, we develop a free-molecular-flow growth model for h-BN synthesis by constructing a narrow gap within Cu/supporting substrates stacking, improving upon earlier studies by increasing domain sizes up to similar to 80 mu m. Further, the edges of h-BN varying from negative-curved to straight, positive-curved, and even round were reliably modified by varying the precursor heating temperature. Moreover, the merging processes of h-BN films are experimentally investigated, demonstrating the Bravais law is applicable for the coalescence of h-BN domains. This work not only offers a promising strategy for high-quality h-BN growth and insight into its growth dynamics which sheds light on reliable edge controllability and possible properties modification of other 2D crystals, but also enriches the understanding of the classical crystal growth theory and extends its applicability into the growth and evolution of 2D crystals.
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
第一 ; 通讯
资助项目
Shenzhen Science and Technology Innovation Committee Maker Project[GRCK2017082316224369]
WOS研究方向
Chemistry ; Crystallography ; Materials Science
WOS类目
Chemistry, Multidisciplinary ; Crystallography ; Materials Science, Multidisciplinary
WOS记录号
WOS:000501621100021
出版者
EI入藏号
20194707703864
EI主题词
Chemical vapor deposition ; Crystals ; III-V semiconductors ; Monolayers ; Nitrides ; Van der Waals forces
EI分类号
Physical Chemistry:801.4 ; Chemical Reactions:802.2 ; Inorganic Compounds:804.2 ; Crystalline Solids:933.1
ESI学科分类
CHEMISTRY
来源库
Web of Science
引用统计
被引频次[WOS]:11
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/50791
专题工学院_材料科学与工程系
作者单位
1.Southern Univ Sci & Technol, Dept Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China
2.Hong Kong Univ Sci & Technol, Dept Phys, Kowloon, Clear Water Bay, Hong Kong, Peoples R China
3.Hong Kong Univ Sci & Technol, Ctr 1D 2D Quantum Mat, Kowloon, Clear Water Bay, Hong Kong, Peoples R China
4.Western Sydney Univ, Ctr Infrastruct Engn, Kingswood, NSW 2751, Australia
第一作者单位材料科学与工程系
通讯作者单位材料科学与工程系
第一作者的第一单位材料科学与工程系
推荐引用方式
GB/T 7714
Wang, Weijun,Shi, Run,Wang, Jingwei,et al. Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers[J]. CRYSTAL GROWTH & DESIGN,2019,19(12):7007-7014.
APA
Wang, Weijun.,Shi, Run.,Wang, Jingwei.,Shen, Nan.,Wang, Yu.,...&Cheng, Chun.(2019).Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers.CRYSTAL GROWTH & DESIGN,19(12),7007-7014.
MLA
Wang, Weijun,et al."Free-Molecular-Flow Modulated Synthesis of Hexagonal Boron Nitride Monolayers".CRYSTAL GROWTH & DESIGN 19.12(2019):7007-7014.
条目包含的文件
文件名称/大小 文献类型 版本类型 开放类型 使用许可 操作
Wang-2019-Free-Molec(3707KB)----限制开放--
个性服务
原文链接
推荐该条目
保存到收藏夹
查看访问统计
导出为Endnote文件
导出为Excel格式
导出为Csv格式
Altmetrics Score
谷歌学术
谷歌学术中相似的文章
[Wang, Weijun]的文章
[Shi, Run]的文章
[Wang, Jingwei]的文章
百度学术
百度学术中相似的文章
[Wang, Weijun]的文章
[Shi, Run]的文章
[Wang, Jingwei]的文章
必应学术
必应学术中相似的文章
[Wang, Weijun]的文章
[Shi, Run]的文章
[Wang, Jingwei]的文章
相关权益政策
暂无数据
收藏/分享
所有评论 (0)
[发表评论/异议/意见]
暂无评论

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。