题名 | Control principle of anodic discharge for enhanced performance in jet-electrochemical discharge machining of semiconductor 4H-SiC |
作者 | |
通讯作者 | Zhao,Yonghua |
发表日期 | 2023-04-28
|
DOI | |
发表期刊 | |
ISSN | 1526-6125
|
EISSN | 2212-4616
|
卷号 | 92页码:435-452 |
摘要 | Implementing anode discharge into electrochemical jet machining (EJM) makes it possible to process semiconductor material 4H-SiC. However, the characteristics and control principle of anodic discharge behavior in EJM remains unclear, while it significantly influences material removal and EJM precision. The present study reveals discharge behavior and its impact on material removal by controlling the imposed electrical and chemical conditions. The physicochemical properties and spatiotemporal distribution of discharges are discussed by analyzing the plasma region's temperature, luminescence, and material removal fashion. The findings reveal that discharges are preferentially ignited in certain areas where the current density is concentrated. The discharge intensity and location are controllable by the pulse cycle and electrical field distribution inside the jet (i.e., changing the jet angle). Reducing pulse duration leads to more localized and mild discharges, improving machining precision. A gas ionization-dominated anodic discharge model is proposed. Both discharge and electrolyte types exert significant influence on material removal. Using a DC supply provides a maximum machining rate of 1.44 mm/min. Meanwhile, an optimal surface finish Ra 170 nm and high shape precision with no overcut is achievable by applying high-frequency AC of 1000 Hz. |
关键词 | |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 第一
; 通讯
|
资助项目 | National Key Research and Devel- opment Program of China[2021YFF0501700]
; Na- tional Natural Science Foundation of China[51905255]
; Shenzhen Science and Technology Program[GJHZ20200731095204014]
; Shenzhen Science and Technology Innovation Commission[JCYJ20190809143217193]
|
WOS研究方向 | Engineering
|
WOS类目 | Engineering, Manufacturing
|
WOS记录号 | WOS:000951735400001
|
出版者 | |
EI入藏号 | 20231213745679
|
EI主题词 | Electric discharges
; Electrolytes
; Ionization of gases
; Magnetic semiconductors
; Physicochemical properties
; Wide band gap semiconductors
|
EI分类号 | Electricity: Basic Concepts and Phenomena:701.1
; Electric Batteries and Fuel Cells:702
; Magnetic Materials:708.4
; Semiconducting Materials:712.1
; Physical Chemistry:801.4
; Chemical Reactions:802.2
; Chemical Agents and Basic Industrial Chemicals:803
; Chemical Products Generally:804
; Inorganic Compounds:804.2
|
Scopus记录号 | 2-s2.0-85150022721
|
来源库 | Scopus
|
引用统计 |
被引频次[WOS]:5
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/515733 |
专题 | 工学院_机械与能源工程系 |
作者单位 | Department of Mechanical and Energy Engineering,Southern University of Science and Technology,Shenzhen,518055,China |
第一作者单位 | 机械与能源工程系 |
通讯作者单位 | 机械与能源工程系 |
第一作者的第一单位 | 机械与能源工程系 |
推荐引用方式 GB/T 7714 |
Lu,Jiajun,Guan,Junming,Dong,Bangyan,et al. Control principle of anodic discharge for enhanced performance in jet-electrochemical discharge machining of semiconductor 4H-SiC[J]. Journal of Manufacturing Processes,2023,92:435-452.
|
APA |
Lu,Jiajun,Guan,Junming,Dong,Bangyan,&Zhao,Yonghua.(2023).Control principle of anodic discharge for enhanced performance in jet-electrochemical discharge machining of semiconductor 4H-SiC.Journal of Manufacturing Processes,92,435-452.
|
MLA |
Lu,Jiajun,et al."Control principle of anodic discharge for enhanced performance in jet-electrochemical discharge machining of semiconductor 4H-SiC".Journal of Manufacturing Processes 92(2023):435-452.
|
条目包含的文件 | 条目无相关文件。 |
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