题名 | Enhanced Performance of a Metal-insulator-semiconductor Structured p/n-Electrode for InGaN-based Green LEDs |
作者 | |
DOI | |
发表日期 | 2023
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会议名称 | 19th China International Forum on Solid State Lighting / 8th International Forum on Wide Bandgap Semiconductors (SSLCHINA) (IFWS)
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ISBN | 979-8-3503-4639-8
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会议录名称 | |
页码 | 303-304
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会议日期 | 7-10 Feb. 2023
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会议地点 | Suzhou, China
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出版地 | 345 E 47TH ST, NEW YORK, NY 10017 USA
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出版者 | |
摘要 | The effect of inserting an insulating layer between the p/n-electrode and the semiconductor are fabricated and investigated for gallium nitride (GaN)-based Micro light-emitting-diodes (mu-LEDs). The 2-nm Al2O3 insulator layer is inserted to form the MIS structure by using an atomic deposition system, which improves the interband tunneling efficiency and the corresponding hole injection efficiency somehow. Therefore, the current-voltage characteristic is increased when compared with a traditional GaN-LED. |
关键词 | |
学校署名 | 第一
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语种 | 英语
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相关链接 | [IEEE记录] |
收录类别 | |
资助项目 | Shenzhen Science and Technology Program[KQTD 20170810110313773]
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WOS研究方向 | Engineering
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WOS类目 | Engineering, Electrical & Electronic
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WOS记录号 | WOS:000982300900076
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EI入藏号 | 20231513885032
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EI主题词 | Alumina
; Aluminum oxide
; Current voltage characteristics
; Efficiency
; III-V semiconductors
; Light emitting diodes
; Metal insulator boundaries
; MIS devices
; Wide band gap semiconductors
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EI分类号 | Semiconducting Materials:712.1
; Semiconductor Devices and Integrated Circuits:714.2
; Inorganic Compounds:804.2
; Production Engineering:913.1
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来源库 | IEEE
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全文链接 | https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10071078 |
引用统计 |
被引频次[WOS]:0
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成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/519624 |
专题 | 南方科技大学 |
作者单位 | Shenzhen Sitan Technology Company, Southern University of Science and Technology, Shenzhen, P.R. China |
第一作者单位 | 南方科技大学 |
第一作者的第一单位 | 南方科技大学 |
推荐引用方式 GB/T 7714 |
Huang Wenjun,Miao Xiangyu,Liu Zhaojun. Enhanced Performance of a Metal-insulator-semiconductor Structured p/n-Electrode for InGaN-based Green LEDs[C]. 345 E 47TH ST, NEW YORK, NY 10017 USA:IEEE,2023:303-304.
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条目包含的文件 | 条目无相关文件。 |
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