题名 | Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation |
作者 | |
通讯作者 | Wang, Qing; Yu, HongYu |
发表日期 | 2023-06-05
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DOI | |
发表期刊 | |
ISSN | 0003-6951
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EISSN | 1077-3118
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卷号 | 122期号:23 |
摘要 | In this work, a dramatic reduction in current collapse is achieved in GaN-based high-electron-mobility transistors (HEMTs) using dual-layer SiNx stressor passivation (DSSP), and the related mechanism is proposed. The SiNx compression neutralizes the inherent piezo polarization caused by the lattice mismatch at the heterojunction and effectively mitigates the peak electric field crowding at the drain-side gate edge, as supported by technology computer-aided design simulation. Thus, the inverse piezoelectric effect is suppressed and the trapped charge density is reduced under high electrical stress. As a result, the current collapse effect can be significantly restrained. Upon pulsing (V-g = -6 and V-ds = 20 V), the device with DSSP exhibits a negligible current collapse (similar to 3%), which is significantly lower than the baseline device (similar to 34%). Moreover, it shows a one-order-of-magnitude reduction in gate leakage and a significant enhancement in gate stability. These results prove that the DSSP process is an attractive technique to facilitate high-reliability GaN-on-Si HEMTs. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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重要成果 | NI论文
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学校署名 | 第一
; 通讯
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资助项目 | Fabrication of Normally-Off GaN Devices based on In situ SiNx Passivation and Selective Area Growth Recessed-Gate Techniques and the Reliability Study (National Natural Science Foundation of China)[62274082]
; Research on the Fabrication and Mechanism of GaN Power and RF Devices[JCYJ20200109141233476]
; Research on the GaN Chip for 5G Applications[JCYJ20210324120409025]
; Preparation and Mechanism Study of Novel Low Resistance Source/Drain Ohmic Electrodes Applied in~GaN p-FET Devices[JCYJ20220530115411025]
; Research on High-Reliable GaN Power Device and Related Industrial Power System[HZQB-KCZYZ-2021052]
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WOS研究方向 | Physics
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WOS类目 | Physics, Applied
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WOS记录号 | WOS:001004596300003
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出版者 | |
ESI学科分类 | PHYSICS
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来源库 | Web of Science
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引用统计 |
被引频次[WOS]:2
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/536994 |
专题 | 工学院_深港微电子学院 |
作者单位 | 1.Southern Univ Sci & Technol, Sch Microelect, Shenzhen, Peoples R China 2.Harbin Inst Technol, Sch Energy Sci & Engn, Harbin 150001, Peoples R China 3.Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China 4.Natl Univ Singapore, Dept Elect & Comp Engn, Singapore, Singapore 5.Southern Univ Sci & Technol, Minist Educ, Engn Res Ctr Integrated Circuits Next Generat Comm, Shenzhen, Peoples R China 6.Southern Univ Sci & Technol, GaN Device Engn Technol Res Ctr Guangdong, Shenzhen, Peoples R China |
第一作者单位 | 深港微电子学院 |
通讯作者单位 | 深港微电子学院; 南方科技大学 |
第一作者的第一单位 | 深港微电子学院 |
推荐引用方式 GB/T 7714 |
Deng, Chenkai,Cheng, Wei-Chih,Chen, XiGuang,et al. Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation[J]. APPLIED PHYSICS LETTERS,2023,122(23).
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APA |
Deng, Chenkai.,Cheng, Wei-Chih.,Chen, XiGuang.,Wen, KangYao.,He, MingHao.,...&Yu, HongYu.(2023).Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation.APPLIED PHYSICS LETTERS,122(23).
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MLA |
Deng, Chenkai,et al."Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation".APPLIED PHYSICS LETTERS 122.23(2023).
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