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题名

Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation

作者
通讯作者Wang, Qing; Yu, HongYu
发表日期
2023-06-05
DOI
发表期刊
ISSN
0003-6951
EISSN
1077-3118
卷号122期号:23
摘要
In this work, a dramatic reduction in current collapse is achieved in GaN-based high-electron-mobility transistors (HEMTs) using dual-layer SiNx stressor passivation (DSSP), and the related mechanism is proposed. The SiNx compression neutralizes the inherent piezo polarization caused by the lattice mismatch at the heterojunction and effectively mitigates the peak electric field crowding at the drain-side gate edge, as supported by technology computer-aided design simulation. Thus, the inverse piezoelectric effect is suppressed and the trapped charge density is reduced under high electrical stress. As a result, the current collapse effect can be significantly restrained. Upon pulsing (V-g = -6 and V-ds = 20 V), the device with DSSP exhibits a negligible current collapse (similar to 3%), which is significantly lower than the baseline device (similar to 34%). Moreover, it shows a one-order-of-magnitude reduction in gate leakage and a significant enhancement in gate stability. These results prove that the DSSP process is an attractive technique to facilitate high-reliability GaN-on-Si HEMTs.
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
重要成果
NI论文
学校署名
第一 ; 通讯
资助项目
Fabrication of Normally-Off GaN Devices based on In situ SiNx Passivation and Selective Area Growth Recessed-Gate Techniques and the Reliability Study (National Natural Science Foundation of China)[62274082] ; Research on the Fabrication and Mechanism of GaN Power and RF Devices[JCYJ20200109141233476] ; Research on the GaN Chip for 5G Applications[JCYJ20210324120409025] ; Preparation and Mechanism Study of Novel Low Resistance Source/Drain Ohmic Electrodes Applied in~GaN p-FET Devices[JCYJ20220530115411025] ; Research on High-Reliable GaN Power Device and Related Industrial Power System[HZQB-KCZYZ-2021052]
WOS研究方向
Physics
WOS类目
Physics, Applied
WOS记录号
WOS:001004596300003
出版者
ESI学科分类
PHYSICS
来源库
Web of Science
引用统计
被引频次[WOS]:2
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/536994
专题工学院_深港微电子学院
作者单位
1.Southern Univ Sci & Technol, Sch Microelect, Shenzhen, Peoples R China
2.Harbin Inst Technol, Sch Energy Sci & Engn, Harbin 150001, Peoples R China
3.Fudan Univ, Sch Microelect, State Key Lab ASIC & Syst, Shanghai 200433, Peoples R China
4.Natl Univ Singapore, Dept Elect & Comp Engn, Singapore, Singapore
5.Southern Univ Sci & Technol, Minist Educ, Engn Res Ctr Integrated Circuits Next Generat Comm, Shenzhen, Peoples R China
6.Southern Univ Sci & Technol, GaN Device Engn Technol Res Ctr Guangdong, Shenzhen, Peoples R China
第一作者单位深港微电子学院
通讯作者单位深港微电子学院;  南方科技大学
第一作者的第一单位深港微电子学院
推荐引用方式
GB/T 7714
Deng, Chenkai,Cheng, Wei-Chih,Chen, XiGuang,et al. Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation[J]. APPLIED PHYSICS LETTERS,2023,122(23).
APA
Deng, Chenkai.,Cheng, Wei-Chih.,Chen, XiGuang.,Wen, KangYao.,He, MingHao.,...&Yu, HongYu.(2023).Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation.APPLIED PHYSICS LETTERS,122(23).
MLA
Deng, Chenkai,et al."Current collapse suppression in AlGaN/GaN HEMTs using dual-layer SiNx stressor passivation".APPLIED PHYSICS LETTERS 122.23(2023).
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