题名 | High repetition-rate photoinjector laser system for (SFEL)-F-3 |
作者 | |
通讯作者 | He, Zhigang; Liu, Wei; Wu, Guorong |
发表日期 | 2023-06-14
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DOI | |
发表期刊 | |
ISSN | 2296-424X
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卷号 | 11 |
摘要 | The photoinjector laser system of Shenzhen Superconducting Soft X-Ray Free Electron Laser ((SFEL)-F-3) is reported in this paper. This laser system operates at up to 1 MHz and produces more than 50 mu J infrared (IR) laser pulses. With a customized fourth harmonic generation (FHG) module, more than 2 mu J ultraviolet (UV) laser pulses were obtained. The power standard deviations of the IR laser and the UV laser are 0.093% and 0.395% respectively. While the pulse energy standard deviations are 1.087% and 1.746% correspondingly. We implemented the pulse stacking scheme to generate flat-top pulses. With four birefringent uniaxial crystals, the Gaussian pulses were converted to flat-top shape, featuring 10 ps pulse width and 0.5 ps rising and falling edges. A cut-Gaussian transverse profile with very sharp rising and falling edges can be produced after the spatial pulse shaper. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 其他
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资助项目 | National Natural Science Foundation of China[12175324]
; Shenzhen Commission of Development and Reform Research funding[ZDKJ20200106001]
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WOS研究方向 | Physics
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WOS类目 | Physics, Multidisciplinary
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WOS记录号 | WOS:001021052100001
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出版者 | |
EI入藏号 | 20233514653959
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EI主题词 | Electrons
; Pulse repetition rate
; Statistics
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EI分类号 | Lasers, General:744.1
; Free Electron Lasers:744.5
; Mathematical Statistics:922.2
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来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:1
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/549385 |
专题 | 理学院_化学系 |
作者单位 | 1.Chinese Acad Sci, Dalian Inst Chem Phys, State Key Lab Mol React Dynam, Dalian, Peoples R China 2.Inst Adv Sci Facil, Shenzhen, Peoples R China 3.Sun Yat Sen Univ, Sch Sci, Shenzhen, Peoples R China 4.Southern Univ Sci & Technol, Dept Chem, Shenzhen, Peoples R China 5.Southern Univ Sci & Technol, Shenzhen Key Lab Energy Chem, Shenzhen, Peoples R China |
推荐引用方式 GB/T 7714 |
Zhang, Baichao,Li, Xiaoshen,Liu, Qi,et al. High repetition-rate photoinjector laser system for (SFEL)-F-3[J]. FRONTIERS IN PHYSICS,2023,11.
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APA |
Zhang, Baichao.,Li, Xiaoshen.,Liu, Qi.,Zhu, Zexiu.,Zhang, Weiqing.,...&Yang, Xueming.(2023).High repetition-rate photoinjector laser system for (SFEL)-F-3.FRONTIERS IN PHYSICS,11.
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MLA |
Zhang, Baichao,et al."High repetition-rate photoinjector laser system for (SFEL)-F-3".FRONTIERS IN PHYSICS 11(2023).
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条目包含的文件 | 条目无相关文件。 |
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