题名 | HFXZR1-XO2 Ferroelectric Thin Film Grain Size Tuning via Annealing Ramp Rate Achieving Endurance >109 Cycles, 2PR of 40.6μC/CM2, Write Voltage Down to 1.5 V, and Switching Speed of 30 NS |
作者 | |
通讯作者 | Yida Li |
DOI | |
发表日期 | 2023
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会议名称 | 2023 China Semiconductor Technology International Conference (CSTIC)
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ISBN | 979-8-3503-1101-3
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会议录名称 | |
页码 | 1-3
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会议日期 | 26-27 June 2023
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会议地点 | Shanghai, China
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摘要 | The effect of annealing temperature ramp rate on the grain growth in $\mathrm{H}\mathrm{f}_{\mathrm{x}}\mathrm{Z}\mathrm{r}_{1-\mathrm{x}}\mathrm{O}$ (HZO) ferroelectric thin film is investigated. Using X-Ray Diffraction (XRD) characterization, we find that the ferroelectric phase grain size and uniformity can be improved when the temperature ramp rate is decreased. When fabricated in a MIM capacitor structure, the device can achieve $2P_{r}$ of $\sim 40.6\mu \mathrm{C}/\mathrm{c}\mathrm{m}^{2}$ better crystalline uniformity as compared to the other devices. Consequently, endurance exceeding $10^{9}$ cycles, 30 ns switching speed, polarization voltages down to 1.5V, and multi-states were demonstrated, paving the path for its use in high performance storage and computing applications. |
关键词 | |
学校署名 | 第一
; 通讯
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相关链接 | [IEEE记录] |
收录类别 | |
EI入藏号 | 20233814740388
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EI主题词 | Annealing
; Ferroelectric Thin Films
; Ferroelectricity
; Film Growth
; Grain Growth
; Hafnium Compounds
; MIM Devices
; Zirconium Compounds
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EI分类号 | Heat Treatment Processes:537.1
; Electricity: Basic Concepts And Phenomena:701.1
; Semiconductor Devices And Integrated Circuits:714.2
; Crystal Growth:933.1.2
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来源库 | IEEE
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全文链接 | https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=10219383 |
引用统计 |
被引频次[WOS]:0
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成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/559154 |
专题 | 南方科技大学 |
作者单位 | 1.Southern University of Science and Technology, Shenzhen, China 2.Shanghai Jiao Tong University, Shanghai, China |
第一作者单位 | 南方科技大学 |
通讯作者单位 | 南方科技大学 |
第一作者的第一单位 | 南方科技大学 |
推荐引用方式 GB/T 7714 |
Zhixiong Li,Bing Zhou,Jiawei Xu,et al. HFXZR1-XO2 Ferroelectric Thin Film Grain Size Tuning via Annealing Ramp Rate Achieving Endurance >109 Cycles, 2PR of 40.6μC/CM2, Write Voltage Down to 1.5 V, and Switching Speed of 30 NS[C],2023:1-3.
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条目包含的文件 | 条目无相关文件。 |
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