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题名

Universal radiation tolerant semiconductor

作者
通讯作者Azarov,Alexander; Kuznetsov,Andrej
发表日期
2023-12-01
DOI
发表期刊
EISSN
2041-1723
卷号14期号:1
摘要
Radiation tolerance is determined as the ability of crystalline materials to withstand the accumulation of the radiation induced disorder. Nevertheless, for sufficiently high fluences, in all by far known semiconductors it ends up with either very high disorder levels or amorphization. Here we show that gamma/beta (γ/β) double polymorph GaO structures exhibit remarkably high radiation tolerance. Specifically, for room temperature experiments, they tolerate a disorder equivalent to hundreds of displacements per atom, without severe degradations of crystallinity; in comparison with, e.g., Si amorphizable already with the lattice atoms displaced just once. We explain this behavior by an interesting combination of the Ga- and O- sublattice properties in γ-GaO. In particular, O-sublattice exhibits a strong recrystallization trend to recover the face-centered-cubic stacking despite the stronger displacement of O atoms compared to Ga during the active periods of cascades. Notably, we also explained the origin of the β-to-γ GaO transformation, as a function of the increased disorder in β-GaO and studied the phenomena as a function of the chemical nature of the implanted atoms. As a result, we conclude that γ/β double polymorph GaO structures, in terms of their radiation tolerance properties, benchmark a class of universal radiation tolerant semiconductors.
相关链接[Scopus记录]
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语种
英语
重要成果
NI论文
学校署名
其他
资助项目
Norges Forskningsråd[197405];Norges Forskningsråd[295864];Norges Forskningsråd[322382];Norges Forskningsråd[337627];Academy of Finland[352518];European Cooperation in Science and Technology[FIT4NACA19140];
WOS研究方向
Science & Technology - Other Topics
WOS类目
Multidisciplinary Sciences
WOS记录号
WOS:001050351300036
出版者
Scopus记录号
2-s2.0-85167674560
来源库
Scopus
引用统计
被引频次[WOS]:24
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/559439
专题工学院_电子与电气工程系
作者单位
1.University of Oslo,Centre for Materials Science and Nanotechnology,Oslo,PO Box 1048 Blindern,N-0316,Norway
2.Department of Electrical and Electronic Engineering,Southern University of Science and Technology,Shenzhen,518055,China
3.Department of Physics,University of Helsinki,Helsinki,P.O. Box 43,FI-00014,Finland
4.Helmholtz-Zentrum Dresden-Rossendorf,Dresden,D-01328,Germany
推荐引用方式
GB/T 7714
Azarov,Alexander,Fernández,Javier García,Zhao,Junlei,et al. Universal radiation tolerant semiconductor[J]. Nature Communications,2023,14(1).
APA
Azarov,Alexander.,Fernández,Javier García.,Zhao,Junlei.,Djurabekova,Flyura.,He,Huan.,...&Kuznetsov,Andrej.(2023).Universal radiation tolerant semiconductor.Nature Communications,14(1).
MLA
Azarov,Alexander,et al."Universal radiation tolerant semiconductor".Nature Communications 14.1(2023).
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