题名 | Universal radiation tolerant semiconductor |
作者 | |
通讯作者 | Azarov,Alexander; Kuznetsov,Andrej |
发表日期 | 2023-12-01
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DOI | |
发表期刊 | |
EISSN | 2041-1723
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卷号 | 14期号:1 |
摘要 | Radiation tolerance is determined as the ability of crystalline materials to withstand the accumulation of the radiation induced disorder. Nevertheless, for sufficiently high fluences, in all by far known semiconductors it ends up with either very high disorder levels or amorphization. Here we show that gamma/beta (γ/β) double polymorph GaO structures exhibit remarkably high radiation tolerance. Specifically, for room temperature experiments, they tolerate a disorder equivalent to hundreds of displacements per atom, without severe degradations of crystallinity; in comparison with, e.g., Si amorphizable already with the lattice atoms displaced just once. We explain this behavior by an interesting combination of the Ga- and O- sublattice properties in γ-GaO. In particular, O-sublattice exhibits a strong recrystallization trend to recover the face-centered-cubic stacking despite the stronger displacement of O atoms compared to Ga during the active periods of cascades. Notably, we also explained the origin of the β-to-γ GaO transformation, as a function of the increased disorder in β-GaO and studied the phenomena as a function of the chemical nature of the implanted atoms. As a result, we conclude that γ/β double polymorph GaO structures, in terms of their radiation tolerance properties, benchmark a class of universal radiation tolerant semiconductors. |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
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重要成果 | NI论文
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学校署名 | 其他
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资助项目 | Norges Forskningsråd[197405];Norges Forskningsråd[295864];Norges Forskningsråd[322382];Norges Forskningsråd[337627];Academy of Finland[352518];European Cooperation in Science and Technology[FIT4NACA19140];
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WOS研究方向 | Science & Technology - Other Topics
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WOS类目 | Multidisciplinary Sciences
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WOS记录号 | WOS:001050351300036
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出版者 | |
Scopus记录号 | 2-s2.0-85167674560
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来源库 | Scopus
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引用统计 |
被引频次[WOS]:24
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/559439 |
专题 | 工学院_电子与电气工程系 |
作者单位 | 1.University of Oslo,Centre for Materials Science and Nanotechnology,Oslo,PO Box 1048 Blindern,N-0316,Norway 2.Department of Electrical and Electronic Engineering,Southern University of Science and Technology,Shenzhen,518055,China 3.Department of Physics,University of Helsinki,Helsinki,P.O. Box 43,FI-00014,Finland 4.Helmholtz-Zentrum Dresden-Rossendorf,Dresden,D-01328,Germany |
推荐引用方式 GB/T 7714 |
Azarov,Alexander,Fernández,Javier García,Zhao,Junlei,et al. Universal radiation tolerant semiconductor[J]. Nature Communications,2023,14(1).
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APA |
Azarov,Alexander.,Fernández,Javier García.,Zhao,Junlei.,Djurabekova,Flyura.,He,Huan.,...&Kuznetsov,Andrej.(2023).Universal radiation tolerant semiconductor.Nature Communications,14(1).
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MLA |
Azarov,Alexander,et al."Universal radiation tolerant semiconductor".Nature Communications 14.1(2023).
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条目包含的文件 | 条目无相关文件。 |
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