题名 | Reversing doping asymmetry in semiconductor thin films with external voltage |
作者 | |
通讯作者 | Luo,Guangfu |
发表日期 | 2023-07-15
|
DOI | |
发表期刊 | |
ISSN | 2469-9950
|
EISSN | 2469-9969
|
卷号 | 108期号:3 |
摘要 | Doping asymmetry is a notable phenomenon with semiconductors and a particularly long-standing challenge limiting the applications of most wide band-gap semiconductors, which are inherent of spontaneous heavy Formula Presented- or Formula Presented-type doping because of their extreme band edges. This study theoretically shows that by applying a proper external voltage on materials during their growth or doping processes, we can largely tune the band edges and consequently reverse the doping asymmetry in semiconductor thin films. We take zinc oxide as a touchstone and computationally demonstrate that this voltage-assisted doping approach efficiently suppresses the spontaneous Formula Presented-type defects by around four orders under three distinct growth conditions and successfully generates Formula Presented-type zinc oxide up to the lowest acceptor levels. The proposed approach is insensitive to materials, growth conditions, or defects origins, and thus offers a general solution to the doping asymmetry in semiconductor thin films. |
相关链接 | [Scopus记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 第一
; 通讯
|
资助项目 | Guangdong Provincial Key Laboratory of Computational Science and Material Design[2019B030301001]
; Introduced Innovative R&D Team of Guangdong[2017ZT07C062]
; Shenzhen Science and Technology Innovation Committee[JCYJ20200109141412308]
|
WOS研究方向 | Materials Science
; Physics
|
WOS类目 | Materials Science, Multidisciplinary
; Physics, Applied
; Physics, Condensed Matter
|
WOS记录号 | WOS:001062107600004
|
出版者 | |
EI入藏号 | 20233014448745
|
EI主题词 | Defects
; Energy gap
; II-VI semiconductors
; Magnetic semiconductors
; Semiconductor doping
; Thin films
; Wide band gap semiconductors
|
EI分类号 | Magnetic Materials:708.4
; Semiconducting Materials:712.1
; Inorganic Compounds:804.2
; Materials Science:951
|
ESI学科分类 | PHYSICS
|
Scopus记录号 | 2-s2.0-85165646821
|
来源库 | Scopus
|
引用统计 |
被引频次[WOS]:0
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/559834 |
专题 | 工学院_材料科学与工程系 |
作者单位 | 1.Department of Materials Science and Engineering,Southern University of Science and Technology,Shenzhen,Guangdong,518055,China 2.Guangdong Provincial Key Laboratory of Computational Science and Material Design,Southern University of Science and Technology,Shenzhen,Guangdong,518055,China |
第一作者单位 | 材料科学与工程系 |
通讯作者单位 | 材料科学与工程系; 南方科技大学 |
第一作者的第一单位 | 材料科学与工程系 |
推荐引用方式 GB/T 7714 |
Liu,Kai,Yi,Zhibin,Luo,Guangfu. Reversing doping asymmetry in semiconductor thin films with external voltage[J]. Physical Review B,2023,108(3).
|
APA |
Liu,Kai,Yi,Zhibin,&Luo,Guangfu.(2023).Reversing doping asymmetry in semiconductor thin films with external voltage.Physical Review B,108(3).
|
MLA |
Liu,Kai,et al."Reversing doping asymmetry in semiconductor thin films with external voltage".Physical Review B 108.3(2023).
|
条目包含的文件 | 条目无相关文件。 |
|
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