题名 | The impact of buffer thickness upon the transport-limited buffer trapping effects in carbon-doped power GaN-on-Si devices |
作者 | |
通讯作者 | Ma, Jun |
发表日期 | 2023-09-11
|
DOI | |
发表期刊 | |
ISSN | 0003-6951
|
EISSN | 1077-3118
|
卷号 | 123期号:11 |
摘要 | In this work, we focused on investigating the transport-limited trapping effects in GaN-on-Si buffer layers as well as impact of the thickness of buffer layers (T-Buf) upon such effects. Vertical transport dynamics of charges within the buffer layers and their key energy levels are quantitatively and statistically investigated and analyzed. The results show that an increased T-Buf diminishes both impurity conduction of the defect band formed by carbon doping as well as the injection of electrons from the substrate, greatly diminishing the current collapse and improving the stability of the device. Such enhancement is mainly attributed to the reduced vertical electric field within the thickened epitaxy, which provides an additional pathway to address the current collapse and yields more efficient power GaN-on-Si devices. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
重要成果 | NI论文
|
学校署名 | 第一
; 通讯
|
资助项目 | National Natural Science Foundation[62104092]
; Natural Science Foundation of Guangdong Province[2021A1515011952]
|
WOS研究方向 | Physics
|
WOS类目 | Physics, Applied
|
WOS记录号 | WOS:001067700900020
|
出版者 | |
EI入藏号 | 20233814763826
|
EI主题词 | Buffer layers
; Carbon
; Electric current measurement
; Electric fields
; III-V semiconductors
|
EI分类号 | Electricity: Basic Concepts and Phenomena:701.1
; Semiconducting Materials:712.1
; Chemical Products Generally:804
; Crystalline Solids:933.1
; Electric Variables Measurements:942.2
|
ESI学科分类 | PHYSICS
|
来源库 | Web of Science
|
引用统计 |
被引频次[WOS]:1
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/575857 |
专题 | 工学院_电子与电气工程系 |
作者单位 | Southern Univ Sci & Technol SUSTech, Dept Elect & Elect Engn, Shenzhen, Peoples R China |
第一作者单位 | 电子与电气工程系 |
通讯作者单位 | 电子与电气工程系 |
第一作者的第一单位 | 电子与电气工程系 |
推荐引用方式 GB/T 7714 |
Liu, Junbo,Zou, Wensong,Chen, Jiawei,et al. The impact of buffer thickness upon the transport-limited buffer trapping effects in carbon-doped power GaN-on-Si devices[J]. APPLIED PHYSICS LETTERS,2023,123(11).
|
APA |
Liu, Junbo,Zou, Wensong,Chen, Jiawei,Hua, Mengyuan,Lu, Di,&Ma, Jun.(2023).The impact of buffer thickness upon the transport-limited buffer trapping effects in carbon-doped power GaN-on-Si devices.APPLIED PHYSICS LETTERS,123(11).
|
MLA |
Liu, Junbo,et al."The impact of buffer thickness upon the transport-limited buffer trapping effects in carbon-doped power GaN-on-Si devices".APPLIED PHYSICS LETTERS 123.11(2023).
|
条目包含的文件 | 条目无相关文件。 |
|
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。
修改评论