A General and Ultrafast Polishing Method with Truly Atomic Roughness

Zhang, Yi1,2; Zhang, Yongjie1,3,4; Gu, Kaixuan1; Zhang, Linfeng1; Zhu, Yuanmin5,6; Liu, Dianzi2; Deng, Hui1

2023-10-12

10.1021/acs.jpclett.3c02322

JOURNAL OF PHYSICAL CHEMISTRY LETTERS   影响因子和分区

1948-7185

The advancement of science and technology is always accompanied by better manufacturing precision. Ideally, the highest precision for manufacturing a surface is truly atomic flatness, which implies that all topmost surface atoms are in a single layer of the crystal face. However, almost no methods can achieve this surface with high efficiency at present. Herein, we present a method to fabricate a large-scale truly atomically flat surface with ultrafast speed. Through the selective etching of surface atoms, our method can achieve an atomically flat surface with 0.05 nm Sa roughness. It is notable that the polishing efficiency of our method is more than 1000 times higher than that of conventional methods. We have demonstrated its generality on various single-crystal materials and obtained atomic roughness and an ultrahigh polishing rate. This method has the potential to promote the mass-production of atomic-scale smooth surfaces, the application of third-generation semiconductor materials, and the innovation of advanced technologies.

SCI ; EI

英语

NI论文

第一 ; 通讯

National Natural Science Foundation of China[52005243] ; Science and Technology Innovation Committee of Shenzhen Municipality["JCYJ20220818100412027","JCYJ20210324120402007"]

Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics

Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Atomic, Molecular & Chemical

WOS:001090563200001

AMER CHEMICAL SOC

20234715095421

Atoms ; Efficiency ; Etching ; Polishing ; Semiconductor materials ; Single crystals

Machining Operations:604.2 ; Semiconducting Materials:712.1 ; Chemical Reactions:802.2 ; Production Engineering:913.1 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Atomic and Molecular Physics:931.3 ; Crystalline Solids:933.1

Web of Science

1.Southern Univ Sci & Technol, Dept Mech & Energy Engn, Shenzhen 518055, Guangdong, Peoples R China
2.Univ East Anglia, Fac Sci, Sch Engn, Norwich NR4 7TJ, England
3.Natl Univ Singapore, Dept Phys, Singapore 117551, Singapore
4.Natl Univ Singapore, Ctr Adv Mat 2D, Singapore 117551, Singapore
5.Southern Univ Sci & Technol, Dept Mat Sci & Engn, Shenzhen 518055, Guangdong, Peoples R China
6.Southern Univ Sci & Technol, Acad Adv Interdisciplinary Studies, Shenzhen 518055, Guangdong, Peoples R China

Zhang, Yi,Zhang, Yongjie,Gu, Kaixuan,et al. A General and Ultrafast Polishing Method with Truly Atomic Roughness[J]. JOURNAL OF PHYSICAL CHEMISTRY LETTERS,2023,14(42):9441-9447.

Zhang, Yi.,Zhang, Yongjie.,Gu, Kaixuan.,Zhang, Linfeng.,Zhu, Yuanmin.,...&Deng, Hui.(2023).A General and Ultrafast Polishing Method with Truly Atomic Roughness.JOURNAL OF PHYSICAL CHEMISTRY LETTERS,14(42),9441-9447.

Zhang, Yi,et al."A General and Ultrafast Polishing Method with Truly Atomic Roughness".JOURNAL OF PHYSICAL CHEMISTRY LETTERS 14.42(2023):9441-9447.