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题名

Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs

作者
通讯作者Jun Ma
发表日期
2023-09-19
DOI
发表期刊
ISSN
0021-4922
EISSN
1347-4065
卷号62期号:9
摘要
This work presented the reverse leakage current (I-R) mechanisms in multi-channel GaN-on-Si Schottky barrier diodes (SBDs). The device showed excellent performances in both ON and OFF-states thanks to the advanced multi-channel tri-gate architecture. The I-R is dominated by thermal field emission at 25 degrees C-75 degrees C before pinch-off of the 2-dimensional electron gas (2DEG) channel in the Schottky region, due to the thinned Schottky barrier, which turned to be thermal emission (TE)-dominated under further elevated temperatures resulted from the small Schottky barrier height. Once the 2DEG channel is pinched off by the tri-anode, the I-R is firstly dominated by Poole-Frenkel emission and then is trap-assisted tunneling after the full depletion of the channels beneath the field plates. These results are supported by excellent consistency between experimental results and theoretical models, offering a key understanding of multi-channel SBDs and shedding lights on this promising multi-channel technology for future energy conversion.(c) 2023 The Japan Society of Applied Physics
关键词
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
第一 ; 通讯
资助项目
This work was supported in part by the National Natural Science Foundation of China (NSFC) on Grant 62104092 and in part by the Natural Science Foundation of Guangdong Province under Grant 2021A1515011952. The author would like to thank staff in Southern U[62104092] ; National Natural Science Foundation of China (NSFC)[2021A1515011952]
WOS研究方向
Physics
WOS类目
Physics, Applied
WOS记录号
WOS:001144970900001
出版者
EI入藏号
20234114854941
EI主题词
Gallium nitride ; III-V semiconductors ; Silicon ; Two dimensional electron gas
EI分类号
Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3 ; Semiconducting Materials:712.1 ; Semiconductor Devices and Integrated Circuits:714.2
ESI学科分类
PHYSICS
来源库
人工提交
引用统计
被引频次[WOS]:1
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/633303
专题工学院_电子与电气工程系
作者单位
Department of Electronic and Electrical Engineering, Southern University of Science and Technology (SUSTech)
第一作者单位电子与电气工程系
通讯作者单位电子与电气工程系
第一作者的第一单位电子与电气工程系
推荐引用方式
GB/T 7714
Wensong Zou,Jiawei Chen,Junbo Liu,et al. Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs[J]. Japanese Journal of Applied Physics,2023,62(9).
APA
Wensong Zou,Jiawei Chen,Junbo Liu,&Jun Ma.(2023).Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs.Japanese Journal of Applied Physics,62(9).
MLA
Wensong Zou,et al."Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs".Japanese Journal of Applied Physics 62.9(2023).
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