题名 | Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs |
作者 | |
通讯作者 | Jun Ma |
发表日期 | 2023-09-19
|
DOI | |
发表期刊 | |
ISSN | 0021-4922
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EISSN | 1347-4065
|
卷号 | 62期号:9 |
摘要 | This work presented the reverse leakage current (I-R) mechanisms in multi-channel GaN-on-Si Schottky barrier diodes (SBDs). The device showed excellent performances in both ON and OFF-states thanks to the advanced multi-channel tri-gate architecture. The I-R is dominated by thermal field emission at 25 degrees C-75 degrees C before pinch-off of the 2-dimensional electron gas (2DEG) channel in the Schottky region, due to the thinned Schottky barrier, which turned to be thermal emission (TE)-dominated under further elevated temperatures resulted from the small Schottky barrier height. Once the 2DEG channel is pinched off by the tri-anode, the I-R is firstly dominated by Poole-Frenkel emission and then is trap-assisted tunneling after the full depletion of the channels beneath the field plates. These results are supported by excellent consistency between experimental results and theoretical models, offering a key understanding of multi-channel SBDs and shedding lights on this promising multi-channel technology for future energy conversion.(c) 2023 The Japan Society of Applied Physics |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
|
学校署名 | 第一
; 通讯
|
资助项目 | This work was supported in part by the National Natural Science Foundation of China (NSFC) on Grant 62104092 and in part by the Natural Science Foundation of Guangdong Province under Grant 2021A1515011952. The author would like to thank staff in Southern U[62104092]
; National Natural Science Foundation of China (NSFC)[2021A1515011952]
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WOS研究方向 | Physics
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WOS类目 | Physics, Applied
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WOS记录号 | WOS:001144970900001
|
出版者 | |
EI入藏号 | 20234114854941
|
EI主题词 | Gallium nitride
; III-V semiconductors
; Silicon
; Two dimensional electron gas
|
EI分类号 | Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3
; Semiconducting Materials:712.1
; Semiconductor Devices and Integrated Circuits:714.2
|
ESI学科分类 | PHYSICS
|
来源库 | 人工提交
|
引用统计 |
被引频次[WOS]:1
|
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/633303 |
专题 | 工学院_电子与电气工程系 |
作者单位 | Department of Electronic and Electrical Engineering, Southern University of Science and Technology (SUSTech) |
第一作者单位 | 电子与电气工程系 |
通讯作者单位 | 电子与电气工程系 |
第一作者的第一单位 | 电子与电气工程系 |
推荐引用方式 GB/T 7714 |
Wensong Zou,Jiawei Chen,Junbo Liu,et al. Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs[J]. Japanese Journal of Applied Physics,2023,62(9).
|
APA |
Wensong Zou,Jiawei Chen,Junbo Liu,&Jun Ma.(2023).Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs.Japanese Journal of Applied Physics,62(9).
|
MLA |
Wensong Zou,et al."Investigation of the leakage mechanism in multi-channel GaN-on-Si SBDs".Japanese Journal of Applied Physics 62.9(2023).
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条目包含的文件 | ||||||
文件名称/大小 | 文献类型 | 版本类型 | 开放类型 | 使用许可 | 操作 | |
2023-JJAP-Investigat(1417KB) | -- | -- | 限制开放 | -- |
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