题名 | The evolution of indium precipitation in gallium focused ion beam prepared samples of InGaAs/InAlAs quantum wells under electron beam irradiation |
作者 | |
通讯作者 | Qiu, Yang |
发表日期 | 2023
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DOI | |
发表期刊 | |
ISSN | 0022-2720
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EISSN | 1365-2818
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摘要 | Gallium ion (Ga+) beam damage induced indium (In) precipitation in indium gallium arsenide (InGaAs)/indium aluminium arsenide (InAlAs) multiple quantum wells and its corresponding evolution under electron beam irradiation was investigated by valence electron energy loss spectroscopy (VEELS) and high-angle annular dark-field imaging (HAADF) in scanning transmission electron microscopy (STEM). Compared with argon ion milling for sample preparation, the heavier projectiles of Ga+ ions pose a risk to trigger In formation in the form of tiny metallic In clusters. These are shown to be sensitive to electron irradiation and can increase in number and size under the electron beam, deteriorating the structure. Our finding reveals the potential risk of formation of In clusters during focused ion beam (FIB) preparation of InGaAs/InAlAs quantum well samples and their subsequent growth under STEM-HAADF imaging, where initially invisible In clusters of a few atoms can move and swell during electron beam exposure. Lay description: In this paper, the evolution of Ga+ implantation induced In precipitation in InGaAs/InAlAs multiple quantum wells under electron beam irradiation was investigated by valence electron energy loss spectroscopy (VEELs), energy dispersive X-ray spectroscopy (EDXs) and high-angle annular dark-field (HAADF) imaging technique based in a probe aberration corrected scanning transmission electron microscope. In contrast to Ar+ ion bombardment, the projectile of focused Ga+ ions is able to trigger the clustering of In interstitials in InGaAs/InAlAs multiple quantum wells, which allows the formation of metallic In precipitates. Afterwards, by exploiting an extensive electron beam rastering on the region of In precipitation, the increase of electron irradiation time could lead to a pronounced swelling of In cluster size. Especially for the region contains In precipitates of several atoms, where the morphology of In cluster is invisible in atomic image. The continuous electron irradiation could give rise to the promotion of In clustering, allowing the structure of In precipitates been resolved by HAADF image. Our finding reveals the potential risk of formation of In precipitates during focused Ga+ ion beam bombarded InGaAs/InAlAs semiconductors and the subsequent evolution of In clustering under electron beam rastering. These findings emphasise the need for caution when studying FIB prepared In-based III–V quantum well specimens using TEM even in the In(Ga,Al)As system, as the initially formed In-rich clusters are so small they can remain invisible for some time. © 2023 Royal Microscopical Society. |
收录类别 | |
语种 | 英语
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学校署名 | 通讯
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资助项目 | This work was supported by the National Natural Science Foundation of China (grant number: 61975075), the Department of Science and Technology of Sichuan Province (grant number: 2023YFH0054), the Technology and Innovation Commission of the Shenzhen Municipality (grant number: JCYJ20190809142019365). The authors acknowledge the assistance of SUSTech Core Research Facilities and the help of Dr. Dong‐Sheng He at Pico Center for the aberration corrected TEM experiments.
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出版者 | |
EI入藏号 | 20240115313776
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EI主题词 | Atoms
; Electron emission
; Electron energy levels
; Electron energy loss spectroscopy
; Electron scattering
; Electrons
; Energy dispersive spectroscopy
; Gallium
; Gallium arsenide
; High resolution transmission electron microscopy
; Indium
; Indium phosphide
; Ion beams
; Ion bombardment
; Scanning electron microscopy
; Secondary ion mass spectrometry
; Semiconducting indium gallium arsenide
; Semiconducting indium phosphide
; Semiconductor quantum wells
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EI分类号 | Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3
; Semiconducting Materials:712.1
; Compound Semiconducting Materials:712.1.2
; Semiconductor Devices and Integrated Circuits:714.2
; Optical Devices and Systems:741.3
; Chemical Products Generally:804
; Inorganic Compounds:804.2
; Atomic and Molecular Physics:931.3
; High Energy Physics:932.1
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ESI学科分类 | BIOLOGY & BIOCHEMISTRY
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来源库 | EV Compendex
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引用统计 |
被引频次[WOS]:2
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/673967 |
专题 | 公共分析测试中心 |
作者单位 | 1.College of Electronic and Information, Southwest Minzu University, State Ethnic Affairs Commission, Chengdu, China 2.Pico Center, SUSTech Core Research Facilities, Southern University of Science and Technology, Shenzhen, China 3.Photon Technology Research Center, Yongjiang Laboratory, Ningbo, China 4.Department Electronic & Electrical Engineering, University of Sheffield, Sheffield, United Kingdom |
通讯作者单位 | 公共分析测试中心 |
推荐引用方式 GB/T 7714 |
Liu, Shuo,Dong, Jiawei,Ma, Zhenyu,et al. The evolution of indium precipitation in gallium focused ion beam prepared samples of InGaAs/InAlAs quantum wells under electron beam irradiation[J]. Journal of Microscopy,2023.
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APA |
Liu, Shuo.,Dong, Jiawei.,Ma, Zhenyu.,Hu, Wenyu.,Deng, Yong.,...&Walther, Thomas.(2023).The evolution of indium precipitation in gallium focused ion beam prepared samples of InGaAs/InAlAs quantum wells under electron beam irradiation.Journal of Microscopy.
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MLA |
Liu, Shuo,et al."The evolution of indium precipitation in gallium focused ion beam prepared samples of InGaAs/InAlAs quantum wells under electron beam irradiation".Journal of Microscopy (2023).
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