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题名

Recent progress on the electronic structure, defect, and doping properties of Ga2O3

作者
发表日期
2020-02-01
DOI
发表期刊
ISSN
2166532X
EISSN
2166-532X
卷号8期号:2
摘要
Gallium oxide (GaO) is an emerging wide bandgap semiconductor that has attracted a large amount of interest due to its ultra-large bandgap of 4.8 eV, a high breakdown field of 8 MV/cm, and high thermal stability. These properties enable GaO a promising material for a large range of applications, such as high power electronic devices and solar-blind ultraviolet (UV) photodetectors. In the past few years, a significant process has been made for the growth of high-quality bulk crystals and thin films and device optimizations for power electronics and solar blind UV detection. However, many challenges remain, including the difficulty in p-type doping, a large density of unintentional electron carriers and defects/impurities, and issues with the device process (contact, dielectrics, and surface passivation), and so on. The purpose of this article is to provide a timely review on the fundamental understanding of the semiconductor physics and chemistry of GaO in terms of electronic band structures, optical properties, and chemistry of defects and impurity doping. Recent progress and perspectives on epitaxial thin film growth, chemical and physical properties of defects and impurities, p-type doping, and ternary alloys with InO and AlO will be discussed.
相关链接[Scopus记录]
收录类别
SCI ; EI
语种
英语
重要成果
ESI高被引
学校署名
其他
资助项目
Science and Technology Research Items of Shenzhen[JCYJ20170412153325679] ; Science and Technology Research Items of Shenzhen[JCYJ20180504165650580]
WOS研究方向
Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目
Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied
WOS记录号
WOS:000517462500001
出版者
EI入藏号
20200908231944
EI主题词
Alumina ; Aluminum alloys ; Aluminum oxide ; Crystal impurities ; Electronic structure ; Energy gap ; Film growth ; Indium alloys ; Indium compounds ; Optical properties ; Passivation ; Power electronics ; Semiconductor doping ; Ternary alloys ; Thin films ; Wide band gap semiconductors
EI分类号
Protection Methods:539.2.1 ; Aluminum Alloys:541.2 ; Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3 ; Semiconducting Materials:712.1 ; Compound Semiconducting Materials:712.1.2 ; Light/Optics:741.1 ; Inorganic Compounds:804.2 ; Crystal Lattice:933.1.1
Scopus记录号
2-s2.0-85081084298
来源库
Scopus
引用统计
被引频次[WOS]:336
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/73908
专题理学院_物理系
作者单位
1.State Key Laboratory of Physical Chemistry of Solid Surfaces,College of Chemistry and Chemical Engineering,Xiamen University,Xiamen,361005,China
2.Department of Physics,Southern University of Science and Technology,Shenzhen, Guangdong,No. 1088, Xueyuan Blvd.,518055,China
3.Centre for Materials Science,School of Chemistry and Physics,Queensland University of Technology,Brisbane,4001,Australia
第一作者单位物理系
推荐引用方式
GB/T 7714
Zhang,Jiaye,Shi,Jueli,Qi,Dong Chen,et al. Recent progress on the electronic structure, defect, and doping properties of Ga2O3[J]. APL Materials,2020,8(2).
APA
Zhang,Jiaye,Shi,Jueli,Qi,Dong Chen,Chen,Lang,&Zhang,Kelvin H.L..(2020).Recent progress on the electronic structure, defect, and doping properties of Ga2O3.APL Materials,8(2).
MLA
Zhang,Jiaye,et al."Recent progress on the electronic structure, defect, and doping properties of Ga2O3".APL Materials 8.2(2020).
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