Hexagonal Ta2O5 (10 1‾ 0) single-crystalline films grown on LaAlO3 (010) substrates by MOCVD

Ma，Xiaochen1; Li，Yuanheng1; Le，Yong2; Zhang，Biao3

2024-08-15

10.1016/j.mssp.2024.108481

Materials Science in Semiconductor Processing   影响因子和分区

1369-8001

Single-crystalline hexagonal tantalum pentoxide (δ-TaO) films were grown on LaAlO (010) substrates by MOCVD. A high substrate temperature of 840 °C was required to achieve the best crystalline quality and the root-mean-square surface roughness of the optimum film was 0.26 nm. The films grew along the δ-TaO [100] direction and the heteroepitaxial relationship between the film and the substrate was confirmed as δ-TaO (100) ‖ LaAlO (010) with δ-TaO [0001] ‖ LaAlO <001>. The film showed a stoichiometric ratio of TaO and a pentavalent state of Ta element. The optical band gap of the single-crystalline δ-TaO film was determined as 4.19 eV.

Heteroepitaxial growth Single-crystalline Wide bandgap δ-Ta2O5

EI

英语

其他

20241916036167

Aluminum compounds ; Energy gap ; Epitaxial growth ; Lanthanum compounds ; Substrates ; Tantalum oxides

Chemical Operations:802.3 ; Chemical Products Generally:804 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Crystal Growth:933.1.2

MATERIALS SCIENCE

2-s2.0-85192082087

Scopus

1.Key Laboratory of Optoelectronics Technology,College of Microelectronics,Beijing University of Technology,Beijing,100124,China
2.Department of Materials Science and Engineering,Guangdong Provincial Key Laboratory of Functional Oxide Materials and Devices,Southern University of Science and Technology,Shenzhen,Guangdong,518055,China
3.School of Microelectronics,Shandong University,Jinan,250101,China

Ma，Xiaochen,Li，Yuanheng,Le，Yong,等. Hexagonal Ta2O5 (10 1‾ 0) single-crystalline films grown on LaAlO3 (010) substrates by MOCVD[J]. Materials Science in Semiconductor Processing,2024,179.

Ma，Xiaochen,Li，Yuanheng,Le，Yong,&Zhang，Biao.(2024).Hexagonal Ta2O5 (10 1‾ 0) single-crystalline films grown on LaAlO3 (010) substrates by MOCVD.Materials Science in Semiconductor Processing,179.

Ma，Xiaochen,et al."Hexagonal Ta2O5 (10 1‾ 0) single-crystalline films grown on LaAlO3 (010) substrates by MOCVD".Materials Science in Semiconductor Processing 179(2024).