A quick diagnostic method for corrosion-inhibition balance and a green slurry for copper chemical mechanical polishing

Zhang，Jiale1,2; Wang，Ning2,3; Yin，Jianhang2; Zhu，Pengli2; Zhao，Tao2

2024-08-01

10.1016/j.mtcomm.2024.109447

Materials Today Communications   影响因子和分区

2352-4928

In this paper, a green inhibitor, adenine, is introduced into the Cu-CMP slurry to prevent the toxic ingestion in the CMP process. Moreover, in order to effectively optimize and control the copper chemical mechanical polishing based on the corrosion-inhibition balance, an expression is proposed to diagnostic the balance quickly via the least square fitting of the experimental data. Based on the corrosion-inhibition balance optimization, a pH-neutral slurry (pH = 6.8 ∼ 7.2) incorporating adenine with a high material removal rate (MRR > 600 nm/min), a low surface roughness (Ra < 1 nm) as well as low surface defects (no micro-scratches, number of surface corrosion pits ≤ 0.02 counts·μm, particle residues ≤ 0.98 counts·μm) is achieved. This newly developed slurry and the diagnostic method for the corrosion-inhibition balance should be promising for designing the green slurry for Cu-CMP.

Chemical mechanical polishing Electrochemical analysis Inhibitor Material removal rate

SCI ; EI

英语

第一

20242316203198

Copper corrosion ; Corrosion inhibitors ; Surface defects ; Surface roughness

Metals Corrosion:539.1 ; Protection Methods:539.2.1 ; Copper:544.1 ; Chemical Agents and Basic Industrial Chemicals:803 ; Physical Properties of Gases, Liquids and Solids:931.2 ; Materials Science:951

2-s2.0-85194847706

Scopus

1.Southern University of Science and Technology,Shenzhen,518055,China
2.Shenzhen Institute of Advanced Electronic Materials,Shenzhen Institute of Advanced Technology,Chinese Academy of Sciences,Shenzhen,518103,China
3.National Key Laboratory of Materials for Integrated Circuits,Shenzhen Institute of Advanced Technology,Chinese Academy of Sciences,Shenzhen,518055,China

Zhang，Jiale,Wang，Ning,Yin，Jianhang,et al. A quick diagnostic method for corrosion-inhibition balance and a green slurry for copper chemical mechanical polishing[J]. Materials Today Communications,2024,40.

Zhang，Jiale,Wang，Ning,Yin，Jianhang,Zhu，Pengli,&Zhao，Tao.(2024).A quick diagnostic method for corrosion-inhibition balance and a green slurry for copper chemical mechanical polishing.Materials Today Communications,40.

Zhang，Jiale,et al."A quick diagnostic method for corrosion-inhibition balance and a green slurry for copper chemical mechanical polishing".Materials Today Communications 40(2024).