南方科技大学知识苑(SUSTech KC): On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering

题名	On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering
作者	Li, Jiewen 1,2; Li, Wanxin 1,2; Feng, Yang 1,2; Wang, Jinzhao 1,2; Yao, Yong 1; Sun, Yunxu 1; Zou, Yi 3; Wang, Jiawei 1; He, Feng 1; Duan, Jianan 1; Chen, Gina Jinna 4; Shum, Perry Ping4 ; Xu, Xiaochuan 1,2,5
通讯作者	Zou, Yi; Wang, Jiawei; Xu, Xiaochuan
发表日期	2024-03-20
DOI	10.1021/acs.nanolett.3c05075
发表期刊	NANO LETTERS 影响因子和分区
ISSN	1530-6984
EISSN	1530-6992
卷号	24 期号:13
摘要	The intriguing and anomalous optical characteristics of exceptional points (EPs) in optical resonators have attracted significant attention. While EP-related phenomena have been observed by perturbing resonators with off-chip components, implementing EPs fully on-chip remains challenging due to their extreme susceptibility to fabrication errors. In this Letter, we propose a succinct and compact approach to reach EP in an on-chip integrated silicon microring resonator by manipulating the evolution of backscatterings with two nanocylinders of disparate diameters. The theoretical analysis unveils that the fabrication constraints could be significantly relieved by increasing the difference in diameters of the nanocylinders. The evolution from non-EP to EP is traced experimentally through the step-by-step tuning of the angular and radial positions of nanocylinders. The proposed method opens a pathway toward the on-chip high-density integration of non-Hermitian devices.
关键词	exceptional point on-chipmicroring backscattering fabrication constraints
相关链接	[来源记录]
收录类别	SCI ; EI
语种	英语
学校署名	其他
资助项目	National Natural Science Foundation of China["JCYJ20210324131614040","JCYJ20220531095604009"] ; Science, Technology and Innovation Commission of Shenzhen Municipality["2020B1515130006","2023A1515011944","2021B515120056"] ; Basic and Applied Basic Research Foundation of Guangdong Province[U22A2093] ; National Natural Science Foundation of China (NSFC)[YZJJLX2020001]
WOS研究方向	Chemistry ; Science & Technology - Other Topics ; Materials Science ; Physics
WOS类目	Chemistry, Multidisciplinary ; Chemistry, Physical ; Nanoscience & Nanotechnology ; Materials Science, Multidisciplinary ; Physics, Applied ; Physics, Condensed Matter
WOS记录号	WOS:001189151400001
出版者	AMER CHEMICAL SOC
ESI学科分类	MATERIALS SCIENCE
来源库	Web of Science
引用统计	被引频次[WOS]：3
成果类型	期刊论文
条目标识符	http://sustech.caswiz.com/handle/2SGJ60CL/788882
专题	南方科技大学
作者单位	1.Xili Univ Town, Harbin Inst Technol, Harbin Inst Technol campus, State Key Lab Tunable Laser Technol,Guangdong Prov, Shenzhen 518055, Guangdong, Peoples R China 2.Harbin Inst Technol, Zhengzhou Res Inst, Zhengzhou 450046, Henan, Peoples R China 3.Shanghai Tech Univ, Sch Informat Sci & Technol, Shanghai 201210, Peoples R China 4.Southern Univ Sci & Technol, Dept EEE, Shenzhen 518055, Peoples R China 5.Pengcheng Natl Lab, Shenzhen 518055, Guangdong, Peoples R China
推荐引用方式 GB/T 7714	Li, Jiewen,Li, Wanxin,Feng, Yang,et al. On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering[J]. NANO LETTERS,2024,24(13).
APA	Li, Jiewen.,Li, Wanxin.,Feng, Yang.,Wang, Jinzhao.,Yao, Yong.,...&Xu, Xiaochuan.(2024).On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering.NANO LETTERS,24(13).
MLA	Li, Jiewen,et al."On-Chip Fabrication-Tolerant Exceptional Points Based on Dual-Scatterer Engineering".NANO LETTERS 24.13(2024).