题名 | Improving Optical and Electronic Performance of Monolayer Silicon Carbide via Metal Doping |
作者 | |
DOI | |
发表日期 | 2023-08-11
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ISSN | 2836-9734
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ISBN | 979-8-3503-3882-9
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会议录名称 | |
会议日期 | 8-11 Aug. 2023
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会议地点 | Shihezi City, China
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摘要 | Two-dimensional SiC materials possess exceptional chemical reactivity and thermal stability, similar to graphene and silicone. Using first-principles computations, this work examines the electrical and optical characteristics of monolayer SiC and doped monolayer SiC with Ag, Co, Fe, and Pt. In monolayer SiC, the Si and C sites have distinctive electronic and optical characteristics, and their interactions with metal dopants result in a variety of electronic structural modifications. The performance of SiC-based electronic devices in semiconductor, optoelectronic, and photovoltaic applications must be optimized in light of these discoveries. SiC monolayer band gap and work function are impacted by doping, with Agdoped SiC showing the greatest reduction in band gap and work function. Doping, especially Ag doping at the C site, which exhibits the greatest absorption coefficient in the visible light spectrum, changes the absorption and reflectance characteristics of monolayer SiC. The loss function is also changed by doping, adding further information about its optical characteristics. This study emphasizes how electrical and optical properties may be modified by doping, providing opportunities for its use in a variety of optoelectronic devices. |
学校署名 | 第一
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相关链接 | [IEEE记录] |
引用统计 | |
成果类型 | 会议论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/789114 |
专题 | 工学院_深港微电子学院 |
作者单位 | 1.School of Microelectronics, Southern University of Science and Technology, Shenzhen, China 2.Research Institute of Fudan University in Ningbo, Ningbo, China 3.ShenZhen PhasedCom Communication Technology Co., Ltd., Shenzhen, China 4.Joint Lab for Advanced Semiconductor Packaging Technologies; Joint Lab for Advanced Packaging and Testing Technology of Integrated Circuits; School of Microelectronics, Southern University of Science and Technology, Shenzhen, China 5.Nanjing Moli Semiconductor Co., Ltd, Nanjing, China |
第一作者单位 | 深港微电子学院 |
第一作者的第一单位 | 深港微电子学院 |
推荐引用方式 GB/T 7714 |
Junfeng Li,Yanlong Tang,Siyuan Xu,et al. Improving Optical and Electronic Performance of Monolayer Silicon Carbide via Metal Doping[C],2023.
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条目包含的文件 | 条目无相关文件。 |
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