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题名

Improving Optical and Electronic Performance of Monolayer Silicon Carbide via Metal Doping

作者
DOI
发表日期
2023-08-11
ISSN
2836-9734
ISBN
979-8-3503-3882-9
会议录名称
会议日期
8-11 Aug. 2023
会议地点
Shihezi City, China
摘要
Two-dimensional SiC materials possess exceptional chemical reactivity and thermal stability, similar to graphene and silicone. Using first-principles computations, this work examines the electrical and optical characteristics of monolayer SiC and doped monolayer SiC with Ag, Co, Fe, and Pt. In monolayer SiC, the Si and C sites have distinctive electronic and optical characteristics, and their interactions with metal dopants result in a variety of electronic structural modifications. The performance of SiC-based electronic devices in semiconductor, optoelectronic, and photovoltaic applications must be optimized in light of these discoveries. SiC monolayer band gap and work function are impacted by doping, with Agdoped SiC showing the greatest reduction in band gap and work function. Doping, especially Ag doping at the C site, which exhibits the greatest absorption coefficient in the visible light spectrum, changes the absorption and reflectance characteristics of monolayer SiC. The loss function is also changed by doping, adding further information about its optical characteristics. This study emphasizes how electrical and optical properties may be modified by doping, providing opportunities for its use in a variety of optoelectronic devices.
学校署名
第一
相关链接[IEEE记录]
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成果类型会议论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/789114
专题工学院_深港微电子学院
作者单位
1.School of Microelectronics, Southern University of Science and Technology, Shenzhen, China
2.Research Institute of Fudan University in Ningbo, Ningbo, China
3.ShenZhen PhasedCom Communication Technology Co., Ltd., Shenzhen, China
4.Joint Lab for Advanced Semiconductor Packaging Technologies; Joint Lab for Advanced Packaging and Testing Technology of Integrated Circuits; School of Microelectronics, Southern University of Science and Technology, Shenzhen, China
5.Nanjing Moli Semiconductor Co., Ltd, Nanjing, China
第一作者单位深港微电子学院
第一作者的第一单位深港微电子学院
推荐引用方式
GB/T 7714
Junfeng Li,Yanlong Tang,Siyuan Xu,et al. Improving Optical and Electronic Performance of Monolayer Silicon Carbide via Metal Doping[C],2023.
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