题名 | A general approach for controllable surface structuring of metals via through-mask electrochemical micromachining under isotropic etching mode |
作者 | |
通讯作者 | Yi, Rong; Deng, Hui |
发表日期 | 2024-07-01
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DOI | |
发表期刊 | |
ISSN | 1432-8488
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EISSN | 1433-0768
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摘要 | Surface structuring has attracted growing interest in the industry due to its potential to improve the macroscopic properties of workpieces. This work investigated the surface structuring of metals by combining thermal oxide film mask and laser lithography with isotropic etching. The metals were thermally oxidized to form a protective oxide film, laser ablation patterned the thermal oxide film, while electrochemical etching operated in the isotropic mode obtained an array of hemispherical cavities. The isotropic etching potential for different metals is taken from the mass transport region of the polarization curve. The effects of thermal oxide film thickness and laser ablation area on the uniformity of the etching holes were studied. The thermal oxidation of TA2 at 350 degrees C formed a 20-nm-thick oxide film, while an array of 10 mu m radius hemispherical microcavities was fabricated on the laser patterning surface via electrochemical etching at 2 V for 1 min. The surface structuring of stainless steel, pure nickel, and tungsten is highly dependent on the ability of the oxide film to avoid electrochemical reactions. The feasibility of combining thermal oxidation and laser lithography with electrochemical etching is of great value for the surface structuring of metallic materials for biomedical and microsystem applications. |
关键词 | |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 通讯
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资助项目 | National Natural Science Foundation of China["52035009","52005243"]
; Science and Technology Innovation Committee of Shenzhen Municipality["JCYJ20200109141003910","JCYJ20210324120402007","KQTD20170810110250357"]
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WOS研究方向 | Electrochemistry
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WOS类目 | Electrochemistry
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WOS记录号 | WOS:001268351100002
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出版者 | |
ESI学科分类 | CHEMISTRY
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来源库 | Web of Science
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引用统计 | |
成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/789957 |
专题 | 工学院_机械与能源工程系 |
作者单位 | 1.Univ South China, Coll Mech Engn, 228 Hengqi Rd, Hengyang 421001, Hunan, Peoples R China 2.George Mason Univ, Dept Mech Engn, Fairfax, VA 22030 USA 3.Southern Univ Sci & Technol, Dept Mech & Energy Engn, 1088 Xueyuan Rd, Shenzhen 518055, Guangdong, Peoples R China |
通讯作者单位 | 机械与能源工程系 |
推荐引用方式 GB/T 7714 |
Yi, Rong,Khan, Muhammad Ajmal,Deng, Hui. A general approach for controllable surface structuring of metals via through-mask electrochemical micromachining under isotropic etching mode[J]. JOURNAL OF SOLID STATE ELECTROCHEMISTRY,2024.
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APA |
Yi, Rong,Khan, Muhammad Ajmal,&Deng, Hui.(2024).A general approach for controllable surface structuring of metals via through-mask electrochemical micromachining under isotropic etching mode.JOURNAL OF SOLID STATE ELECTROCHEMISTRY.
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MLA |
Yi, Rong,et al."A general approach for controllable surface structuring of metals via through-mask electrochemical micromachining under isotropic etching mode".JOURNAL OF SOLID STATE ELECTROCHEMISTRY (2024).
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