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题名

Quantitative evaluation of PI-RDL interfacial delamination in fan-out wafer-level packaging during unbiased highly accelerated stress test

作者
通讯作者Wang, Ke; Wu, Jingshen
发表日期
2024-10-01
DOI
发表期刊
ISSN
1350-6307
EISSN
1873-1961
卷号164
摘要
Fan-Out Wafer-Level Packaging (FOWLP) is increasingly utilized for its superior performance, facilitated by flexible heterogeneous integration. Despite its advantages, the interface between Polyimide (PI) and Redistribution Layers (RDL) is susceptible to significant vulnerabilities, notably delamination. This study introduces a quantitative method to assess PI-RDL interface delamination in FOWLP under unbiased Highly Accelerated Stress Tests (uHAST), a standard approach in accelerated reliability testing characterized by high humidity and temperature. Central to our methodology is the development of a time-temperature-moisture equivalencebased creep constitutive model, which significantly enhances our understanding of the impact of temperature and moisture on creep behavior. Furthermore, we have developed an innovative "open moisture absorption" method for preparing samples for four-point bending tests, enabling precise quantification of the time-induced degradation of PI-RDL interfacial fracture toughness under saturated conditions. Our comprehensive finite element model integrates moisture diffusion, the newly developed creep constitutive model, and solid mechanics to accurately simulate the accumulation of strain energy release rate during uHAST, facilitating precise predictions of delamination initiation times in FOWLP. Experimental validation under two uHAST conditions-130 degrees C/85 %RH for 96 h and 110 degrees C/85 %RH for 264 h-demonstrates the effectiveness of our approach, predicting the delamination initiation time at the PI-RDL interface with over 80 % accuracy. This predictive methodology is pivotal in enhancing the structural optimization and extending the service life of FOWLP in varied environmental conditions.
关键词
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
通讯
资助项目
Department of Science and Technology of Guangdong Province[2023B0101020004]
WOS研究方向
Engineering ; Materials Science
WOS类目
Engineering, Mechanical ; Materials Science, Characterization & Testing
WOS记录号
WOS:001276029600001
出版者
EI入藏号
20243016749568
EI主题词
Bending tests ; Constitutive models ; Creep ; Ductile fracture ; Electronics packaging ; Fracture toughness ; Moisture ; Strain energy ; Strain rate ; Structural optimization
EI分类号
Strength of Building Materials; Test Equipment and Methods:422 ; Mathematics:921 ; Optimization Techniques:921.5 ; Numerical Methods:921.6 ; Mechanics:931.1 ; Materials Science:951
ESI学科分类
ENGINEERING
来源库
Web of Science
引用统计
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/789985
专题工学院_系统设计与智能制造学院
作者单位
1.Hong Kong Univ Sci & Technol Guangzhou, Thrust Smart Mfg, Syst Hub, Guangzhou 511400, Peoples R China
2.Guangzhou HKUST FOK YING TUNG Res Inst, Ctr Engn Mat & Reliabil, Guangzhou 511400, Peoples R China
3.Hong Kong Univ Sci & Technol Guangzhou, Lab Future Technol, Guangzhou 511400, Peoples R China
4.Southern Univ Sci & Technol, Sch Syst Design & Intelligent Mfg, Shenzhen 518055, Peoples R China
通讯作者单位系统设计与智能制造学院
推荐引用方式
GB/T 7714
Wu, Wenyu,Zhao, Wenzhe,Chen, Kai,et al. Quantitative evaluation of PI-RDL interfacial delamination in fan-out wafer-level packaging during unbiased highly accelerated stress test[J]. ENGINEERING FAILURE ANALYSIS,2024,164.
APA
Wu, Wenyu.,Zhao, Wenzhe.,Chen, Kai.,Ma, Baoguang.,Lu, Dong.,...&Wu, Jingshen.(2024).Quantitative evaluation of PI-RDL interfacial delamination in fan-out wafer-level packaging during unbiased highly accelerated stress test.ENGINEERING FAILURE ANALYSIS,164.
MLA
Wu, Wenyu,et al."Quantitative evaluation of PI-RDL interfacial delamination in fan-out wafer-level packaging during unbiased highly accelerated stress test".ENGINEERING FAILURE ANALYSIS 164(2024).
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