中文版 | English
题名

Multi-channel GaN varactors and their current conduction mechanisms

作者
通讯作者Ma, Jun
发表日期
2024-07-15
DOI
发表期刊
ISSN
0003-6951
EISSN
1077-3118
卷号125期号:3
摘要
In this work, we demonstrate multi-channel GaN varactors with enhanced quality-factor (Q-factor) and cutoff frequency (f0) and present a comprehensive investigation of their current conduction mechanisms. The varactors were based on 1x-, 2x-, and 3x-channel GaN-on-SiC epitaxy with excellent channel conductivity, showing great enhancement of ∼270% both in Q-factor and in f0, thanks to the reduced resistance and capacitance by multi-channels in AC conduction. The DC leakage current (I) in the three types of devices is dominated by Poole-Frenkel (PF) emission and trap-assisted tunneling, before the depletion of the topmost channel and after the depletion of the bottommost channel, respectively. The I in multi-channel devices is dominated by two-dimensional variable range hopping of electrons along the vertical direction between channels, when the topmost channel is depleted while the bottommost channel is not. The analysis is supported by excellent agreement between experimental results and theoretical models, along with activation energies (EA) quantitatively and statistically determined, presenting a promising technology with key understandings for future performance enhancement.
© 2024 Author(s).
相关链接[来源记录]
收录类别
SCI ; EI
语种
英语
学校署名
第一 ; 通讯
资助项目
The authors would like to thank the staff in Core Research Facilities (SCRF) in Southern University of Science and Technology (SUSTech) for their technical support. This work was supported in part by the National Natural Science Foundation of China (NSFC) under Grant No. 62104092 and in part by the High level of special funds under Grant No. G030230001 from SUSTech, Shenzhen, China.
WOS研究方向
Physics
WOS类目
Physics, Applied
WOS记录号
WOS:001283205700001
出版者
EI入藏号
20243016746803
EI主题词
Activation analysis ; Activation energy ; Cutoff frequency ; III-V semiconductors ; Q factor measurement ; Schottky barrier diodes ; Silicon ; Silicon carbide ; Varactors
EI分类号
Nonferrous Metals and Alloys excluding Alkali and Alkaline Earth Metals:549.3 ; Semiconducting Materials:712.1 ; Semiconductor Devices and Integrated Circuits:714.2 ; Inorganic Compounds:804.2 ; Electric Variables Measurements:942.2
ESI学科分类
PHYSICS
来源库
EV Compendex
引用统计
成果类型期刊论文
条目标识符http://sustech.caswiz.com/handle/2SGJ60CL/794444
专题工学院_电子与电气工程系
南方科技大学
作者单位
1.Department of Electronic and Electrical Engineering, Southern University of Science and Technology (SUSTech), Shenzhen; 518055, China
2.Enkris Semiconductor Inc., Suzhou; 215123, China
第一作者单位电子与电气工程系
通讯作者单位电子与电气工程系
第一作者的第一单位电子与电气工程系
推荐引用方式
GB/T 7714
Zou, Wensong,Chen, Jiawei,Hou, Xiaoxiang,et al. Multi-channel GaN varactors and their current conduction mechanisms[J]. Applied Physics Letters,2024,125(3).
APA
Zou, Wensong.,Chen, Jiawei.,Hou, Xiaoxiang.,Xiang, Peng.,Cheng, Kai.,...&Ma, Jun.(2024).Multi-channel GaN varactors and their current conduction mechanisms.Applied Physics Letters,125(3).
MLA
Zou, Wensong,et al."Multi-channel GaN varactors and their current conduction mechanisms".Applied Physics Letters 125.3(2024).
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