题名 | Ultra-low-defect homoepitaxial micro-LEDs with enhanced efficiency and monochromaticity for high-PPI AR/MR displays |
作者 | |
通讯作者 | Liu, Zhaojun |
发表日期 | 2024-08-14
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DOI | |
发表期刊 | |
EISSN | 2662-1991
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卷号 | 5期号:1 |
摘要 | The issue of brightness in strong ambient light conditions is one of the critical obstacles restricting the application of augmented reality (AR) and mixed reality (MR). Gallium nitride (GaN)-based micro-LEDs, renowned for their exceptional brightness and stability, are considered the foremost contenders for AR applications. Nevertheless, conventional heteroepitaxial growth micro-LED devices confront formidable challenges, including substantial wavelength shifts and efficiency droop. In this paper, we firstly demonstrated the high-quality homoepitaxial GaN-on-GaN micro-LEDs micro-display, and thoroughly analyzed the possible benefits for free-standing GaN substrate from the material-level characterization to device optoelectronic properties and micro-display application compared with sapphire substrate. The GaN-on-GaN structure exhibits a superior crystal quality with ultra-low threading dislocation densities (TDDs) of similar to 10(5) cm(-2), which is three orders of magnitude lower than that of GaN-on-Sapphire. Through an in-depth size-dependent optoelectronic analysis of blue/green emission GaN-on-GaN/ Sapphire micro-LEDs from 100 x 100 shrink to 3 x 3 mu m(2), real that a lower forward voltage and series resistance, a consistent emission wavelength (1.21 nm for blue and 4.79 nm for green @ 500 A/cm(2)), coupled with a notable reduction in efficiency droop ratios (15.6% for blue and 28.5% for green @ 500 A/cm(2)) and expanded color gamut (103.57% over Rec. 2020) within GaN-on-GaN 10 mu m micro-LEDs. Last but not least, the GaN-on-GaN micro-display with 3000 pixels per inch (PPI) showcased enhanced display uniformity and higher luminance in comparison to its GaN-on-Sapphire counterpart, demonstrating significant potentials for high-brightness AR/MR applications under strong ambient light. |
相关链接 | [来源记录] |
收录类别 | |
语种 | 英语
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学校署名 | 通讯
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WOS研究方向 | Optics
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WOS类目 | Optics
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WOS记录号 | WOS:001291668800001
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出版者 | |
来源库 | Web of Science
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引用统计 |
被引频次[WOS]:1
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成果类型 | 期刊论文 |
条目标识符 | http://sustech.caswiz.com/handle/2SGJ60CL/804702 |
专题 | 工学院_电子与电气工程系 |
作者单位 | 1.Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Peoples R China 2.Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen, Peoples R China 3.Chinese Acad Sci, Suzhou Inst Nanotech & Nanob, Jiangsu Inst Adv Semicond, Suzhou, Peoples R China |
通讯作者单位 | 电子与电气工程系 |
推荐引用方式 GB/T 7714 |
Liu, Yibo,Wang, Guobin,Feng, Feng,et al. Ultra-low-defect homoepitaxial micro-LEDs with enhanced efficiency and monochromaticity for high-PPI AR/MR displays[J]. PHOTONIX,2024,5(1).
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APA |
Liu, Yibo.,Wang, Guobin.,Feng, Feng.,Zhanghu, Mengyuan.,Yuan, Zhengnan.,...&Liu, Zhaojun.(2024).Ultra-low-defect homoepitaxial micro-LEDs with enhanced efficiency and monochromaticity for high-PPI AR/MR displays.PHOTONIX,5(1).
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MLA |
Liu, Yibo,et al."Ultra-low-defect homoepitaxial micro-LEDs with enhanced efficiency and monochromaticity for high-PPI AR/MR displays".PHOTONIX 5.1(2024).
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